PECVD System

PECVD System

The Opt-PECVD furnace series offers advanced Chemical Vapor Deposition (CVD) technology for high-quality thin film deposition across a wide range of applications. With models capable of reaching temperatures from 1200°C to 1700°C, these furnaces are ideal for semiconductor research, graphene growth, and Li-Ion battery studies. Equipped with precise gas flow control, customizable heating zones, and high-precision thermal management, the Opt-PECVD furnaces ensure reliable, high-performance results for demanding material deposition processes.

The Opt-PECVD furnace series is designed for Chemical Vapor Deposition (CVD) processes, particularly suitable for depositing a wide range of films used in semiconductor and material research applications. These furnaces are widely employed in fields like graphene growth, Li-Ion battery research, and advanced thin-film deposition. With high temperature capabilities and precise control over the deposition process, the Opt-PECVD series ensures high-quality film formation for various applications.

Each model in the Opt-PECVD series—Opt-PECVD 1200, Opt-PECVD 1400, and Opt-PECVD 1700—offers unique features to meet specific user needs. They feature programmable control systems, precision thermal management, and customizable gas flow settings, all in a compact, robust design. The systems are equipped with advanced MFC (Mass Flow Controllers) for precise gas flow control, as well as options for rotary or turbo molecular pumps to achieve the desired vacuum levels.

The different models in this series cater to various temperature and operational requirements, ranging from standard film deposition to highly demanding processes. Whether you need a furnace for high-quality passivation layers or for applications requiring more specialized mask formation, the Opt-PECVD furnace series provides flexibility and performance.

Key Features:

  • Windows-based LCD touchscreen control panel
  • Programmable for up to 30 steps
  • Maximum temperature ranges from 1200°C to 1700°C
  • Fe-Cr-Al alloy heating elements
  • Customizable tube diameters and heating zones
  • Advanced PID thermal control system with ±1°C precision
  • MFC gas flow control system for accurate gas distribution
  • Optional turbo or rotary pumps for precise vacuum control

 

PECVD Furnace Models Comparison

Feature Opt-PECVD 1200 Opt-PECVD 1400 Opt-PECVD 1700
Max Temperature 1200°C 1400°C 1700°C
Continuous Operating Temp 1100°C 1300°C 1600°C
Control Panel Windows LCD Touch Screen Windows LCD Touch Screen Windows LCD Touch Screen
Heating Element Fe-Cr-Al alloy Fe-Cr-Al alloy Fe-Cr-Al alloy
Thermocouple Type Type S Type K Type B
Tube Quartz Quartz Alumina
Max Heating Rate 20°C/min 20°C/min 20°C/min
Vacuum Pump Included Included Included
MFC Gas Flow Control 3 Independent MFCs 3 Independent MFCs 3 Independent MFCs
Plasma Output Power 5-500W 5-500W 5-500W
Frequency 13.56 MHz 13.56 MHz 13.56 MHz
Cooling Air Cooling Air Cooling Air Cooling
Vacuum Flange Stainless Steel Stainless Steel Stainless Steel

 

These models can be further customized to meet specific requirements for different processes, making them versatile for a wide range of applications, from basic thin-film deposition to advanced material research. The Opt-PECVD furnace series offers reliable performance with precision control, making them ideal for laboratories, research institutions, and industrial applications.