CVD Furnace



Starting From 22.000$

CVD growth system is to produce chemical reaction using a mixture of gaseous compounds on the substrate surface, thus generating non-volatile coating on substrate surface, a kind of thin film material preparation system. It consists of vacuum tube furnace, multi-channel pneumatic system and vacuum system. CVD growth system is suitable for the CVD process, such as silicon carbide coating, ceramic substrate conductivity test, controlled growth of ZnO nanostructures, such as ceramic capacitors (MLCC) atmosphere sintering experiment.

CVD vacuum system can equip turbo molecular pump system or diffusion pump system, vacuum degree is up to 0.001pa;multi channels gas supply system can equip float flow meter or mass flow meter, which features wide measure range and high accuracy; meanwhile other different function and purpose can be designed according to specific requirement.

Model OPT-T1200-V OPT-T1400-V OPT-T1700-V
Max. temperature 1200° C 1400° C 1700° C
Work temperature 1100° C 1300° C 1600° C
Heating rate 0-20° 0-20° 0-15°
Heating element Resistance wire with Mo SiC heating elements MoSi2 heating elements
Thermal couple K type S type B type
Fiber Liner 1430 alumina fiber 1600 alumina fiber 1800 alumina fiber
Chamber material Ceramic fiber/Metal Shield
Temperature rise rate 0-20°/min
Temperature accuracy ±1℃
Temperature uniformity ±5℃
Rated Power 110-415V,50/60Hz
Gas Control Float flow meter/Mass flow meter
Vacuum Unit Rotary vane/Diffusion/Turbo molecular pump