Our CVD furnaces, available in three models—Opt-CVD 1200, Opt-CVD 1400, and Opt-CVD 1700—are precision systems designed for advanced Chemical Vapor Deposition applications. With customizable tube sizes, heating zones, and gas flow channels, these furnaces provide reliable performance for semiconductor manufacturing, thin film deposition, and material research. Offering temperature ranges from 1200°C to 1700°C, they are equipped with advanced control panels and optional features like turbo pumps and plasma systems, making them ideal for various high-temperature, high-precision processes.
Feature | Opt-CVD 1200 | Opt-CVD 1400 | Opt-CVD 1700 |
---|---|---|---|
Max Temperature | 1200°C | 1400°C | 1700°C |
Continuous Operating Temp | 1100°C | 1300°C | 1600°C |
Heating Element | Mo with Fe-Cr-Al alloy | Mo with Fe-Cr-Al alloy | Mo with Fe-Cr-Al alloy |
Heating Speed | Max 20°C/min, Avg 10°C/min | Max 20°C/min, Avg 10°C/min | Max 20°C/min, Avg 10°C/min |
Tube Size | 30-200 mm (customizable) | 30-200 mm (customizable) | 30-200 mm (customizable) |
Heating Zone | 200-440 mm (customizable) | 200-440 mm (customizable) | 200-440 mm (customizable) |
Gas Flow Channels (MFC) | 2-6 (optional) | 2-6 (optional) | 2-6 (optional) |
Plasma Option | Available | Available | Available |
Vacuum Gauge | Optional Digital Vacuum Gauge | Optional Digital Vacuum Gauge | Optional Digital Vacuum Gauge |
Control Panel | Windows-based LCD Touchscreen | Windows-based LCD Touchscreen | Windows-based LCD Touchscreen |
Optional Turbo Pump | Available | Available | Available |