CVD Furnace

CVD Furnace

Our CVD furnaces, available in three models—Opt-CVD 1200, Opt-CVD 1400, and Opt-CVD 1700—are precision systems designed for advanced Chemical Vapor Deposition applications. With customizable tube sizes, heating zones, and gas flow channels, these furnaces provide reliable performance for semiconductor manufacturing, thin film deposition, and material research. Offering temperature ranges from 1200°C to 1700°C, they are equipped with advanced control panels and optional features like turbo pumps and plasma systems, making them ideal for various high-temperature, high-precision processes.

Our CVD furnaces are advanced systems designed for precise material processing, ideal for Chemical Vapor Deposition (CVD) applications. Available in three distinct models—Opt-CVD 1200, Opt-CVD 1400, and Opt-CVD 1700—these furnaces offer versatile heating capabilities, customizable options, and reliable performance in various research and industrial processes. Whether for semiconductor production, thin film deposition, or material research, these furnaces provide unparalleled control over temperature and vacuum environments.

Key Features:

  • Precise Temperature Control: Each model is equipped with advanced PID temperature controllers for high precision.
  • Flexible Tube Sizes & Heating Zones: Optional tube diameters and heating zones (200-500 mm) allow for customization to meet specific experimental requirements.
  • Vacuum & Gas Control: Optional turbo pumps, MFC gas controllers (up to 6 channels), and digital vacuum gauges ensure optimal conditions for deposition.
  • High-Temperature Applications: Models are designed for operations at temperatures ranging from 1200°C to 1700°C, suitable for a wide range of processes.

The furnaces are equipped with advanced Windows-based touchscreen control panels, enabling easy programming with up to 30 steps. These models are compatible with various substrates and gases for applications in semiconductor, nanotechnology, MEMS, and energy storage industries.

 

Feature Opt-CVD 1200 Opt-CVD 1400 Opt-CVD 1700
Max Temperature 1200°C 1400°C 1700°C
Continuous Operating Temp 1100°C 1300°C 1600°C
Heating Element Mo with Fe-Cr-Al alloy Mo with Fe-Cr-Al alloy Mo with Fe-Cr-Al alloy
Heating Speed Max 20°C/min, Avg 10°C/min Max 20°C/min, Avg 10°C/min Max 20°C/min, Avg 10°C/min
Tube Size 30-200 mm (customizable) 30-200 mm (customizable) 30-200 mm (customizable)
Heating Zone 200-440 mm (customizable) 200-440 mm (customizable) 200-440 mm (customizable)
Gas Flow Channels (MFC) 2-6 (optional) 2-6 (optional) 2-6 (optional)
Plasma Option Available Available Available
Vacuum Gauge Optional Digital Vacuum Gauge Optional Digital Vacuum Gauge Optional Digital Vacuum Gauge
Control Panel Windows-based LCD Touchscreen Windows-based LCD Touchscreen Windows-based LCD Touchscreen
Optional Turbo Pump Available Available Available

 

These CVD furnaces are engineered for consistency, ease of use, and flexibility, making them ideal for high-end research, development, and production in a variety of fields including semiconductor, nanotechnology, and material science.