Optosense OPT-TH-DSK Desktop Evaporation Coating System is a versatile and space-efficient solution developed for high-quality thin film deposition in research and laboratory settings. Designed to evaporate both metallic and selected non-metallic materials, the system enables the production of uniform and high-purity coatings with excellent repeatability.

Its compact footprint makes it ideal for laboratories with limited space, while still offering powerful performance and advanced functionality. The system supports both manual and automatic operation modes, allowing users to adapt the process according to specific experimental requirements.

Equipped with a rotating substrate holder, the system ensures homogeneous coating across the sample surface. The integrated film thickness monitoring system allows real-time control during deposition, enhancing process accuracy and consistency.

With its intuitive control interface, robust design, and integrated safety features, the OPT-TH-DSK provides a reliable and efficient solution for laboratories focused on precision coating, material research, and thin film development.

Key Features

Compact & Portable Design:
Space-saving structure with dimensions optimized for laboratory use and easy integration.

High Deposition Performance:
Capable of delivering stable and efficient coating processes with high evaporation current.

Rotating Substrate Holder:
Adjustable rotation speed (0–60 rpm) ensures uniform film distribution.

Real-Time Thickness Monitoring:
Integrated system allows continuous measurement and control of film thickness.

Flexible Operation Modes:
Supports both manual and automatic control for maximum process flexibility.

User-Friendly Interface:
Intuitive control panel enables easy parameter adjustment and monitoring.

Enhanced Safety Features:
Includes protection systems and warning mechanisms for safe operation under high-temperature conditions.

Technical Specifications

Applications

The Optosense OPT-TH-DSK Desktop Evaporation Coating System is ideal for thin film deposition of metallic and non-metallic materials. It is widely used in research and development laboratories requiring precise, efficient, and repeatable coating processes. Its compact design and reliable performance make it particularly suitable for academic research, prototyping, and small-scale production.